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SEMulator3D的过程预测能力使半导体供应链中的所有参与者受益，从技术开发人员到无晶圆厂IP提供商，再到设备和工艺供应商。
从输入设计数据开始，SEMulator3D遵循集成的工艺流程描述，以创建在晶圆厂中创建的复杂3D结构的虚拟等效物。
SEMulator3D^®是一个功能强大的3D半导体和MEMS工艺建模平台，可提供广泛的技术开发能力。基于高效的物理驱动体素建模技术，SEMulator3D具有对完整流程进行建模的独特能力。

核心流程建模
SEMulator3D 建模引擎使用独特的物理驱动 3D 建模技术，可以对各种单元处理步骤进行建模。每个工艺步骤只需要几个易于理解和校准的几何和物理输入参数。就像在实际的晶圆厂中一样，上游单元工艺参数（如沉积保形性、蚀刻各向异性、选择性等）相互作用，并以复杂的方式设计数据，以影响最终的器件结构。
高级流程建模
为了正确预测完整流程流的最终结果，必须准确建模每个流程步骤。SEMulator3D 高级过程建模为标准库添加了额外的过程步骤，例如多色差和选择性外延。这些步骤提供了更准确的等离子体（干）蚀刻、选择性外延生长等建模。
自动化
SEMulator3D 自动化是一个电子表格驱动的自动化引擎，可实现大规模并行的过程变异研究。通过自动构建一系列具有特定工艺参数变化的 SEMulator3D 模型，SEMulator3D 自动化能够对工艺公差、良率或跨晶圆均匀性进行虚拟研究。
分析学
SEMulator3D 分析模块可直接在 SEMulator3D 中自动执行过程变异的统计分析。新的 Analytics 用户界面可指导用户使用各种技术（包括蒙特卡罗过程变异）设计、执行和分析大型统计实验。自动多变量回归用于识别重要参数，并根据其对过程变异的影响对它们进行排名。
设备分析
器件分析功能作为电气分析模块的一部分，可以提取晶体管的电气特性，并探索晶体管过程对器件性能的可变性，所有这些都直接在SEMulator3D中进行。
电气分析
电气分析模块增加了强大的电阻和电容提取功能，以加深对工艺和设计灵敏度的理解。电气分析模块可以直接在SEMulator3D中计算导体网的电阻和网的电容，为3D建模和电功能验证提供单一平台。
可视化
SEMulator3D 查看器显示虚拟设备模型在流程中每个步骤的 3D 渲染。分步可视化有助于了解过程故障模式和其他复杂的过程现象。横截面和尺寸测量可以在3D模型的任何地方进行。SEMulator3D Viewer具有许多高级功能，包括流程步骤的自动动画和自动导出到Microsoft PowerPoint。

生成网格以导出为标准网格格式
全套布局查看和编辑工具
通过完整的Python脚本API进行定制
用 Python 编写的新流程建模功能库
过程技术文件示例

Coventor SEMulator3D 8.0 – the newest version of its semiconductor virtual fabrication platform. With added features, performance improvements, and a new Process Window Optimization capability, SEMulator3D 8.0 addresses both process and device simulation while lowering the barriers to advanced semiconductor technology development. The new Process Window Optimization (PWO) feature performs process window optimization without the requirement for time-consuming and expensive silicon wafer tests. This capability, in conjunction with existing SEMulator3D features, enables earlier understanding of critical process factors and their impact on yield.

SEMulator3D 8.0 Productivity Enhancements

The new version of SEMulator3D 8.0, which is available now, includes many additional features and performance enhancements such as:

Process Window Optimization

The new Process Window Optimization workflow can be used to understand and identify the ranges of input parameters (i.e. the process window) needed to achieve user-defined performance goals and optimize product yield. (more)

New Electrical Analysis Functionality

A new ‘Validate Netlist’ feature is available to validate and merge extracted netlist files with reference CDL (circuit design language) netlists obtained from 3rd-party electronic design automation (EDA) tools. In addition, the resistance and capacitance solvers in Electrical Analysis are now substantially faster (up to 40X) compared to previous versions of SEMulator3D

Transistor Modeling Enhancements

Small signal AC analysis is currently available, to accurately extract device capacitance and explore transistor process variability on device performance. A new variety of physical phenomena, such as field-dependent recombination and band-to-band tunneling, are now supported in the device solver.

Additional Process Modeling Features

A new Monte Carlo implant step provides a more realistic ion implantation model, through advanced simulation of the ion implantation profile.

Custom Process Flows

A new feature to import custom process flows and create SEMulator3D input files has been added, to support site-specific process flows
HomePage: http://www.coventor.com/
Language: English
FileSize: 1.1 Gb
Operating Systems: Windows 7/8.x/10.x 64Bit
Previous Versions: Coventor SEMulator3D 8.0 x64

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